Impact of Diffusion Mask Strain on Impurity-Induced Disordered VCSELs Designed for Single-Fundamental-Mode Operation

The strain of diffusion masks utilized for impurity-induced disordering is demonstrated to control the curvature of the diffusion front, and therefore disordering front, of the disordered distributed Bragg reflector (DBR) aperture. As a result, the disordered apertures formed under strain conditions varying from compressive to tensile are shown to significantly impact the electro-optical performance and spectral characteristics of impurity-induced disordered (IID) VCSELs designed for single-fundamental-mode operation. An investigation and analysis of the electro-optical performance and spectral characteristics of IID-VCSELs as a result of varying diffusion mask strain is presented.

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